| 摘要 |
PROBLEM TO BE SOLVED: To provide an eccentricity-amount measurement method and eccentricity-amount measurement device that allow an amount of eccentricity to be measured in short time regardless of a shape of a lens surface or the number of lenses constituting an optical system.SOLUTION: A method configured to irradiate an inspected optical system arranged on a measurement axis with a light flux and measure an amount of eccentricity comprises: an acquisition process S100 of acquiring wavefront data on the basis of the light flux emitted from the inspected optical system; a first extraction process S200 of extracting a prescribed aberration component from the wavefront data; a second extraction process S300 of extracting a first aberration component from the prescribed aberration component; and an analysis process S400 of analyzing a simultaneous linear equation about the first aberration component, eccentricity aberration sensitivity and amount of eccentricity. The prescribed aberration component is an aberration component that has an aberration component to be created by eccentricity included, the first aberration component is an aberration component proportional to a first power of the amount of eccentricity of the prescribed aberration component, and the eccentricity aberration sensitivity is aberration sensitivity proportional to a first power of the amount of eccentricity.SELECTED DRAWING: Figure 4 |
