| 摘要 |
PROBLEM TO BE SOLVED: To provide exposure equipment capable of reducing astigmatism and advantageous for stabilizing optical characteristics.SOLUTION: Exposure equipment 100 exposes, through a projection optical system 60, a pattern of an original plate 20 on a base plate 30. The exposure equipment 100 includes: gas supply means 84, etc. configured to supply a gas to an optical element 65, etc. arranged in vicinity of a pupil position of the projection optical system 60; and control means 90 configured to control the gas supply means 84. Here, the control means 90 controls the gas supply means 90 so that a direction of a gas supply is changed according to temperature distribution of the optical element 65, etc. caused by irradiation of exposure light.SELECTED DRAWING: Figure 1 |
