| 摘要 |
PROBLEM TO BE SOLVED: To provide techniques relating to the field of correcting errors of a photolithographic mask.SOLUTION: A method for correcting a plurality of errors of a photolithographic mask comprises optimizing first parameters of an imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask, and correcting the plurality of errors by applying an imaging transformation using optimized first parameters and locally directing the laser beam onto the photolithographic mask using optimized second parameters, where the first and the second parameters are simultaneously optimized in a joint optimization process.SELECTED DRAWING: Figure 1 |
