| 发明名称 |
NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
A compound which is non-ionic compound, the compound has a group represented by formula (Ia):;;wherein R2 represents a group having a C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site. |
| 申请公布号 |
US2016145186(A1) |
申请公布日期 |
2016.05.26 |
| 申请号 |
US201514950342 |
申请日期 |
2015.11.24 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MASUYAMA Tatsuro;MUKAI Yuichi;ICHIKAWA Koji |
| 分类号 |
C07C61/40;G03F7/038;G03F7/32;G03F7/20;G03F7/38;C08F222/18;G03F7/16 |
主分类号 |
C07C61/40 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A compound which is non-ionic compound,
the compound comprising a group represented by formula (Ia): wherein R2 represents a group having a C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site. |
| 地址 |
Tokyo JP |
