| 摘要 |
A method and device for cleaning a shadow mask. The method for cleaning a shadow mask comprises: providing an alkaline conductive solution (23), and immersing a shadow mask into the alkaline conductive solution (23); connecting the shadow mask to one of the anode and the cathode of a power supply, and immersing the other of the anode and the cathode into the alkaline conductive solution (23); and switching on the power supply, allowing the alkaline conductive solution (23) to perform ionization reaction and produce gas, and allowing the gas to remove contaminants from the shadow mask. In this way, dust, other particles and photoresist residues can be effectively removed from the shadow mask, the production yield rate of an organic light-emitting display panel can be increased, and the production cost can be reduced. |
