| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with fewer defects and good line edge roughness can be produced.SOLUTION: The resist composition comprises a resin (A1) having an acid-labile group, a resin (A2) having a structural unit represented by formula (I), and an acid generator. In the formula, Rrepresents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom; Rrepresents a fluorinated saturated hydrocarbon group having 1 to 12 carbon atoms; and Arepresents an alkanediyl group having 2 to 6 carbon atoms or *-A-X-(A-X)-A-, where * represents a bond in -O-CO- with an oxygen atom.SELECTED DRAWING: None |
