| 发明名称 |
BAKING DEVICE FOR A WAFER COATED WITH A COATING CONTAINING A SOLVENT |
| 摘要 |
A baking device for a wafer coated with a coating containing a solvent is described, having a baking chamber, a support for the wafer, an inlet for a purge gas, and an evacuation for the purge gas charged with solvent evaporated from the coating. The inlet is formed as a diffusion element arranged above the wafer so as to admit the purge gas evenly over substantially the entire surface of the wafer, and the evacuation is formed as an evacuation ring which radially surrounds the diffusion element and is arranged at a ceiling of the baking chamber. |
| 申请公布号 |
US2016148823(A1) |
申请公布日期 |
2016.05.26 |
| 申请号 |
US201514948877 |
申请日期 |
2015.11.23 |
| 申请人 |
SUSS MicroTec Lithography GmbH |
发明人 |
George Gregory;Foley Aaron;Treichel Oliver |
| 分类号 |
H01L21/67;F27D7/00 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A baking device for a wafer coated with a coating containing a solvent, the baking device comprising:
a baking chamber; a support for the wafer, the support being integrated within the chamber and configured for placement of the wafer on the support; an inlet for purge gas, the inlet being formed as a diffusion element arranged above the wafer so as to admit the purge gas evenly over substantially the entire surface of the wafer; and an evacuation for the purge gas charged with solvent evaporated from the coating, the evacuation being formed as an evacuation ring radially surrounding the diffusion element and arranged at a ceiling of the baking chamber. |
| 地址 |
Garching DE |
