EXPLOITATION OF SECOND-ORDER EFFECTS IN ATOMIC FORCE MICROSCOPY

摘要

A processing system cooperates with an atomic force microscope operating in ramp mode at a ramp frequency is configured to collect data indicative of at least one of physical and chemical properties of a sample. The system collects data indicative of probe movement at a frequency that is higher than the ramp frequency. This data comprises a second-order portion of the probe's signal. Based at least in part on the second-order portion, the processor obtains a parameter that is indicative at least one of a physical and a chemical property of a sample.

主权项

1. An apparatus for evaluating one of a physical and a chemical property of a surface, said apparatus comprising a processing system configured to cooperate with an atomic force microscope operating in ramp mode at a ramp frequency, said processing system being configured to collect data indicative of at least one of physical and chemical properties of a sample, wherein said processing system is configured to receive a probe signal indicative of movement of a probe at a frequency that is higher than said ramp frequency, wherein said probe signal comprises a first portion indicative of deflection and a second portion that consists of second-order effects, and wherein said processing system is further configured to obtain a parameter that is indicative at least one of a physical and a chemical property of a sample based at least in part on said second portion of said probe signal.