Alcohol Assisted ALD Film Deposition

摘要

Methods of depositing a metal selectively onto a metal surface relative to a dielectric surface are described. Methods include reducing a metal oxide surface to a metal surface and protecting a dielectric surface to minimize deposition thereon and exposing the substrate to a metal precursor and an alcohol to deposit a film.

主权项

1. A method of depositing a film, the method comprising exposing a substrate to a first reactive gas comprising one or more of copper, cobalt, nickel or tungsten and a second reactive gas comprising an alcohol.