| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a sealing film in which the sealing film having high barrier properties can be stably formed.SOLUTION: There is provided a method of forming a sealing film in which the sealing film is formed by depositing a buffer layer M1 and a barrier layer M2 having high density than the buffer layer M1 alternately on a base material 2. The method comprises: a first buffer film deposition process of depositing a first buffer layer M1a on a surface of the base material 2; a first barrier layer deposition process of depositing the barrier layer M2 on a surface of the first buffer layer M1; and a second buffer layer deposition process of depositing a second buffer layer M1b on a surface of the barrier layer M2 deposited in the first barrier layer deposition process. A ratio of a film thickness of a part, deposited in a direction inclined to a thickness direction, of the first buffer layer M1a to a film thickness of a part deposited in a thickness direction of the base material 2 is closer to 1 than a ratio of a film thickness of a part, deposited in a direction inclined to the thickness direction, of the second buffer layer M1b to a film thickness of a part deposited in the thickness direction.SELECTED DRAWING: Figure 4 |
