发明名称 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source device, capable of extending a life of an optical element inside the device and outputting stable EUV light, during a burst operation.SOLUTION: In an extreme ultraviolet light source device, a target 13 is irradiated with a main pulse L1 to emit EUV light L generated by burst oscillation. The extreme ultraviolet light source device includes a burst control unit C1 for controlling such that, during a burst operation in which the burst oscillation is performed, the main pulse L1 is output while a driver laser 1 outputting the main pulse L1 is in a continuous emission operation, and, when continuous emission during the burst operation is paused, the target material 13 is prevented from being irradiated with the main pulse L1 at a plasma emission site P10 of the EUV light L to pause the emission of the EUV light L.SELECTED DRAWING: Figure 1
申请公布号 JP2016096148(A) 申请公布日期 2016.05.26
申请号 JP20150241546 申请日期 2015.12.10
申请人 GIGAPHOTON INC 发明人 MORIYA MASATO;HAYASHI HIDEYUKI;ABE TORU
分类号 H05G2/00;G03F7/20;H01S3/00;H01S3/10 主分类号 H05G2/00
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