| 摘要 |
PROBLEM TO BE SOLVED: To provide a compound, a resin, and a resist composition, from which a resist pattern having good CD (critical dimension) uniformity can be produced.SOLUTION: The compound is represented by formula (I). The resin and the resist composition comprise a structural unit derived from the above compound. In the formula (I), Rrepresents a hydrogen atom, a halogen, or an alkyl group having 1 to 6 carbon atoms which may have a halogen; Rrepresents a perfluoroalkyl group or *-CHRfRf, where Rfand Rfeach independently represent a perfluoroalkyl group; Arepresents a single bond, an alkanediyl group, or the like; Arepresents an alkanediyl group; and Wrepresents a divalent alicyclic hydrocarbon group, and particularly, Wpreferably represents an adamantanediyl group or a cyclohexadiyl group.SELECTED DRAWING: None |
