| 主权项 |
1. A pattern formation method, comprising:
(1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having a repeating unit represented by General Formula (I) and a repeating unit represented by any one of General Formulas (II) to (IV), and a crosslinking agent (C), wherein, in General Formula (I), each of R41, R42, and R43 independently represents a hydrogen atom, an alkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group; here, R42 may be bonded to Ar4 to form a ring, and R42 in this case represents a single bond or an alkylene group; X4 represents a single bond, —COO—, or —CONR44—, and, in the case of forming a ring with R42, represents a trivalent connecting group; R44 represents a hydrogen atom or an alkyl group: L4 represents a single bond or an alkylene group; Ar4 represents an (n+1) valent aromatic ring group, and, in the case of being bonded to R42 to form a ring, represents an (n+2) valent aromatic ring group; and n represents an integer of 1 to 4, wherein, in General Formula (II), each of R61, R62, and R63 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group; here, R62 may be bonded to Ar6 to form a ring, and R62 in this case represents a single bond or an alkylene group; X6 represents a single bond, —COO—, or —CONR64—; R64 represents a hydrogen atom or an alkyl group; L6 represents a single bond or an alkylene group; Ar6 represents a divalent aromatic ring group, and, in the case of being bonded to R62 to form a ring, represents a trivalent aromatic ring group; R3 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkoxy group, an acyl group, or a heterocyclic group; M3 represents a single bond or a divalent connecting group; Q3 represents an alkyl group, a cycloalkyl group, an aryl group, or a heterocyclic group; and at least two of Q3, M3, and R3 may be bonded to each other to form a ring, wherein, in General Formula (III), each of R51, R52, and R53 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group; R52 may be bonded to L5 to form a ring, and R52 in this case represents an alkylene group; L5 represents a single bond, or an alkylene group, —COO-L1-, —O-L1-, or a divalent connecting group selected from the groups formed by combining two or more thereof, and L1 represents an alkylene group or a cycloalkylene group; here, in a case where L5 is bonded to R52 to form a ring, L5 represents a trivalent connecting group; R54 represents an alkyl group, and each of R55 and R56 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; and R55 and R56 may be bonded to each other to form a ring; however, R55 and R56 do not represent a hydrogen atom at the same time in any case, and wherein, in General Formula (IV), each of R71, R72, and R73 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group; R72 may be bonded to L7 to form a ring, and R72 in this case represents an alkylene group; L7 represents a single bond or a divalent connecting group, and in the case of forming a ring with R72, represents a trivalent connecting group; R74 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkoxy group, an acyl group, or a heterocyclic group; M4 represents a single bond or a divalent connecting group; Q4 represents an alkyl group, a cycloalkyl group, an aryl group, or a heterocyclic group; and at least two of Q4, M4, and R74 may be bonded to each other to form a ring. |
