发明名称 |
METHOD OF MANUFACTURING TEMPLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a pattern for imprinting having a high accuracy fine pattern and a method of manufacturing a template.SOLUTION: A method of forming a pattern for imprinting includes: laminating a chromium thin film 41 on a substrate 31; forming a polymerizable resin layer 33 on the chromium thin film 41; overlapping a prepared transparent template 10 for imprinting and the polymerizable resin layer 33 on the a quartz substrate 31; molding the polymerizable resin layer 33 with a first pattern 13, which is a pattern of the template 10 for imprinting; forming on the polymerizable resin layer 33 a second pattern 43 constituted of irregularity which is a reverse type shape of the first pattern; forming a third pattern 45 constituted of a chromium thin film on the quartz substrate 31 using the second pattern 43 as a mask; and forming a fourth pattern 47 constituted of irregularity on a surface of the substrate 31 using the third pattern 45 as a mask.SELECTED DRAWING: Figure 4 |
申请公布号 |
JP2016096361(A) |
申请公布日期 |
2016.05.26 |
申请号 |
JP20160024487 |
申请日期 |
2016.02.12 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
HOGEN MORIHISA;SUZUKI KOSUKE |
分类号 |
H01L21/027;B29C33/38;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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