| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist detachment liquid and a resist detachment method capable of easily being detached even with a high crosslinked and high cured resist layer.SOLUTION: There is provided a resist detachment liquid containing a detachment auxiliary consisting of an amide-based organic solvent, water, a halide of alkali metals and/or alkali earth metals, containing water of 0.30 mol/kg to 3.50 mol/kg and the detachment auxiliary of 0.02 mol/kg to 2.00 mol/kg and having molar ratio represented by the detachment auxiliary/the water of 0.02 to 1.10.SELECTED DRAWING: None |
