PATTERN VERIFYING METHOD

摘要

The present invention provides a pattern verifying method. First, a target pattern is decomposed into a first pattern and a second pattern. A first OPC process is performed for the first pattern to form a first revised pattern, and a second OPC process is performed for the second pattern to form a second revised pattern. An inspection process is performed, wherein the inspection process comprises an after mask inspection (AMI) process, which comprises considering the target pattern, the first pattern and the second pattern.

主权项

1. A pattern verifying method related to a double patterning technology (DPT) process, comprising:
decomposing the target pattern into a first pattern and a second pattern by using a computer system; performing a first optical proximity correction (OPC) process for the first pattern to obtain a first revised pattern, and performing a second OPC process for the second pattern to obtain a second revised pattern; and performing an inspection process, wherein the inspection process comprises an after mask inspection (AMI) process, which comprises considering the target pattern, the first pattern and the second pattern.