| 摘要 |
A lithography apparatus includes a stage for maintaining a substrate on which a mark is formed; an image sensor having an image region; a processor which reads data on an image of the mark to obtain a position of the mark by row; and a control part for determining a position of the substrate based on the position of the mark. When the processor obtains a position of a first mark on a first substrate, the control part moves the stage with respect to the image sensor to allow an image of the first mark, rather than an image of a second mark on a second substrate having a pattern before the pattern is formed on the first substrate, to be adjacent to a row where the processor starts to read the data. So, the time required for position measurement of an align mask can be reduced. |
