| 发明名称 |
MICROBOLOMETER DEVICES IN CMOS AND BiCMOS TECHNOLOGIES |
| 摘要 |
A microbolometer device integrated with CMOS and BiCMOS technologies and methods of manufacture are disclosed. The method includes forming a microbolometer unit cell, comprises damaging a portion of a substrate to form a damaged region. The method further includes forming infrared (IR) absorbing material on the damaged region. The method further includes isolating the IR absorbing material by forming a cavity underneath the IR absorbing material. |
| 申请公布号 |
US2016146672(A1) |
申请公布日期 |
2016.05.26 |
| 申请号 |
US201414553203 |
申请日期 |
2014.11.25 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LIU Qizhi;STAMPER Anthony K.;WALLER Ronald F. |
| 分类号 |
G01J5/20;H01L37/00;H01J37/317 |
主分类号 |
G01J5/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of forming a microbolometer unit cell, comprising:
damaging a portion of a substrate to form a damaged region; forming infrared (IR) absorbing material on the damaged region; and isolating the IR absorbing material by forming a cavity underneath the IR absorbing material. |
| 地址 |
Armonk NY US |
