IMPRINT APPARATUS, METHOD OF CALIBRATING CORRECTION MECHANISM, AND METHOD OF MANUFACTURING ARTICLE

摘要

An imprint apparatus includes a mold holding unit configured to hold a mold, a correction mechanism configured to correct a shape of a pattern formed in the mold to a desired shape by applying a force to the mold held in the mold holding unit, and a controller configured to assume a plurality of mold pattern shapes for a specific mold, calculate a parameter for associating the plurality of assumed mold pattern shapes and a deformation amount of the specific mold by causing the correction mechanism to apply the force to the specific mold to obtain the deformation amount of the specific mold so that the plurality of assumed mold pattern shapes are formed, and calibrate the correction mechanism using the parameter.

主权项

1. An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, the imprint apparatus comprising:
a mold holding unit configured to hold the mold; a correction mechanism configured to correct a shape of a pattern formed in the mold to a desired shape by applying a force to the mold held in the mold holding unit; and a controller configured to assume a plurality of mold pattern shapes for a specific mold, calculate a parameter for associating the plurality of assumed mold pattern shapes and a deformation amount of the specific mold by causing the correction mechanism to apply the force to the specific mold to obtain the deformation amount of the specific mold so that the plurality of assumed mold pattern shapes are formed, and calibrate the correction mechanism using the parameter.