| 摘要 |
An extreme ultraviolet light generating device that generates extreme ultraviolet light by generating plasma by irradiating a target with pulsed laser light outputted from a laser device may be provided. This extreme ultraviolet light generating device may include: a chamber; a target supply unit that supplies a target to a plasma generating region in the chamber; a target sensor, which is positioned between the target supply unit and the plasma generating region, and detects the target passing through a detection region; and a shielding cover, which is disposed between the detection region and the target supply unit, and includes a through hole through which the target passes, said shielding cover reducing pressure waves being transmitted from the plasma generating region to the target supply unit. |
