| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with fewer defects and good line edge roughness can be produced.SOLUTION: The resist composition comprises a resin (A1) having a group represented by formula (a4-x), a resin (A2) having two or more types of acid-labile groups represented by formula (1) and/or formula (2), and an acid generator. In the formulae, n and na each represents 0 or 1; Rrepresents a saturated hydrocarbon group having a fluorine atom; R, Rand Reach represents an alkyl group, an alicyclic hydrocarbon group or a combined group of these, or Rand Rare bonded to each other to form a divalent alicyclic hydrocarbon group; Rand Reach represents a hydrogen atom or a hydrocarbon group and Rrepresents a hydrocarbon group, or Rand Rare bonded to each other to form a divalent heterocycle; and X represents O or S.SELECTED DRAWING: None |
