| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which an error in an alignment measurement of a substrate is reduced.SOLUTION: A lithographic apparatus comprises: a stage that holds a substrate and is movable; a scope that measures a position of a mark formed to a surface of the substrate; and a control part that controls the movement of stage so as to form the pattern based on the mark position measured by the scope. In the case where the surface of substrate has a rotational deviation in a circumstance of a first axis of one of an XYZ coordinate system to the stage, the control part estimates the position of mark in a direction of a second axis direction perpendicular to the first axis based on the rotational deviation amount, allows the stage to move to the second axis direction based on the estimated mark position, and thereafter, measures the mark position based on the scope.SELECTED DRAWING: Figure 7 |
