| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent undesirable gases in a wafer container from flowing into a wafer processing apparatus, when purging the internal space of the wafer container. <P>SOLUTION: An opener provided at the load port of the wafer processing apparatus has a drive system for driving a door and a chamber, and a purge mechanism for purging the internal space of the wafer container. Three actuators of the drive system are provided on the outside of the chamber. The supply port of the purge mechanism is provided at a position higher than the wafer container, and the exhaust port is provided at a position lower than the wafer container. During the purging, the internal space of the wafer container and the internal space of the chamber are connected to form one enclosed purge space. <P>COPYRIGHT: (C)2013,JPO&INPIT |
