发明名称 |
PHOTOCURABLE COMPOSITION |
摘要 |
A rapid-curing photocurable composition exerting excellent adhesion performance even with a low cumulative light quantity and being curable in a short time, thus ensuring excellent workability, is provided. A photocurable composition is made to includes:(A) a crosslinkable silicon group-containing organic polymer; (B) a photobase generator; and (C1) a silicon compound having an Si-F bond and/or (C2) one or more fluorine-based compounds selected from the group consisting of boron trifluoride, a boron trifluoride complex, a fluorinating agent, and an alkali metal salt of a polyfluoro compound. The (B) photobase generator is preferably a photolatent tertiary amine. |
申请公布号 |
EP3023462(A1) |
申请公布日期 |
2016.05.25 |
申请号 |
EP20140827038 |
申请日期 |
2014.07.11 |
申请人 |
CEMEDINE CO., LTD. |
发明人 |
YAMAGA, HIROSHI;OKAMURA, NAOMI;WATANABE, YUTAKA;ASAI, RYOSUKE;KOUNO, SHOUMA;SAITO, ATSUSHI |
分类号 |
C08L101/10;C08K3/38;C08K5/16;C08K5/17;C08K5/54;C09D183/00;C09J183/00 |
主分类号 |
C08L101/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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