发明名称 RETAINER RING AND METHOD THEROF BY CHEMICAL MECHANICAL POLISHER
摘要 The present invention relates to a retainer ring which fixes the position of a semiconductor wafer in a chemical mechanical polishing process and a method for manufacturing the same. The present invention provides a retainer ring of a new material combination method and a manufacturing method. Price competitiveness is gained by using the retainer ring formed by the combination of a metallic material and a resin material, and increases the bonding force between the metallic material and the resin material by using an insert injection mold method. Meanwhile, especially, more enhanced cohesion between heterogeneous materials can be secured by applying a hole filled with resin and a groove structure in the inner ring of a metallic material. So, durability and functionality can be improved.
申请公布号 KR20160058654(A) 申请公布日期 2016.05.25
申请号 KR20140160424 申请日期 2014.11.17
申请人 YU, SEUNG YEOL 发明人 YU, SEUNG YEOL
分类号 H01L21/304;B24B37/32 主分类号 H01L21/304
代理机构 代理人
主权项
地址