发明名称 干渉フィルターの製造方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an interference filter capable of preventing decrease in manufacturing efficiency, while preventing degradation of a reflection coating. <P>SOLUTION: A method for manufacturing a wavelength variable interference filter 5 includes: a first substrate formation process for forming a fixed substrate 51 through depositing a fixed reflection coating 54 and a first bonding film 531 on the fixed substrate 51; a second substrate formation process for forming a movable substrate 52 through depositing a movable reflection coating 55 and a second bonding film 532 on the movable substrate 52; and a bonding process for bonding the first bonding film 531 and the second bonding film 532 so as to bond the fixed substrate 51 and the movable substrate 52. The first bonding film 531 and the second bonding film 532 contain siloxane. In the bonding process, N<SB POS="POST">2</SB>plasma treatment or Ar plasma treatment is performed to the first bonding film 531 and the second bonding film 532 to activate each surface, and thereafter, the first bonding film 531 and the second bonding film 532 are bonded together using siloxane bond. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5923912(B2) 申请公布日期 2016.05.25
申请号 JP20110210330 申请日期 2011.09.27
申请人 セイコーエプソン株式会社 发明人 荒川 克治
分类号 G02B26/00;B81C3/00 主分类号 G02B26/00
代理机构 代理人
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