MASK HAVING A PELLICLE, PELLICLE REPAIRING APPARATUS, AND SUBSTRATE MANUFACTURING EQUIPMENT

摘要

The present invention discloses a mask. The mask includes a mask substrate, mask patterns on the mask substrate, frames arranged on the edge of the mask substrate of the circumference of the mask patterns, and a pellicle which is separated from the mask patterns and is arranged on the frames. The pellicle may include protection layers having a thickness of several nanometers.