| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer to be used for a composition for forming a resist underlay film, from which a resist underlay film can be formed with a high etching rate, excellent adhesiveness to a resist film, and high resistance to pattern collapse.SOLUTION: The polymer includes: an acrylate structural unit (I) having a cyclic carbonate structure; an acrylate structural unit (II-1) having a 1-15C alkyl group or a 6-20C aryl group, in which a part of hydrogen atoms or the whole hydrogen atoms are replaced by substituents having at least one hydroxyl group or an amino group; and an acrylate structural unit (II-2) having a phenyl group, a naphthyl group, an anthryl group, or a 1-15C linear or branched alkyl group. |
