发明名称 ACTIVATION CHAMBER AND KIT USED IN TREATMENT DEVICE FOR LOWERING ELECTRON AFFINITY, TREATMENT DEVICE THAT CONTAINS SAID KIT AND IS USED TO LOWER ELECTRONIC AFFINITY, PHOTOCATHODE ELECTRON-BEAM SOURCE, ELECTRON GUN CONTAINING PHOTOCATHODE ELECTRON-BEAM SOURCE, FREE-ELECTRON LASER ACCELERATOR, TRANSMISSION ELECTRON MICROSCOPE, SCANNING ELECTRON MICROSCOPE, ELECTRON-BEAM HOLOGRAPHY MICROSCOPE, ELECTRON-BEAM LITHOGRAPHY DEVICE, ELECTRON-BEAM DIFFRACTION DEVICE, AND ELECTRON-BEAM SCANNING DEVICE
摘要 This invention provides a treatment device for lowering electron affinity, said treatment device being capable of performing an EA surface treatment on a photocathode material or an EA surface retreatment on a photocathode, and an electron-beam device provided with said treatment device. An activation chamber (20) used in a treatment device for lowering electron affinity by vaporizing a surface-treatment material (30) and using the vaporized surface-treatment material (30) to perform an electron-affinity lowering treatment on a photocathode material (52) or an electron-affinity lowering retreatment on a photocathode (52), said activation chamber (20) being characterized by containing holes through which electrons can pass.
申请公布号 EP3024012(A1) 申请公布日期 2016.05.25
申请号 EP20140826750 申请日期 2014.06.12
申请人 NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY 发明人 NISHITANI TOMOHIRO
分类号 H01J37/073;H01J1/34;H01J9/12;H01J37/06 主分类号 H01J37/073
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