METHOD FOR FORMING EMBOSSED PATTERN BY LASER DIRECT WRITING AND EMBOSSED PATTERN FORMED THEREBY
摘要
Provided is a method of forming a thin film pattern capable of reducing processing time and manufacturing costs without a complicated photo lithography process and an imprint process. The method of forming a thin film pattern according to an embodiment of the present invention includes: a step of preparing a polymeric membrane; and a step of forming a pattern protruding from a surface of the polymeric membrane by emitting a laser to the polymeric membrane. The power of the laser beam is emitted less than a film cut critical point in which the polymeric membrane is cut by the laser beam.
申请公布号
KR20160058359(A)
申请公布日期
2016.05.25
申请号
KR20140159160
申请日期
2014.11.14
申请人
KOREA INSTITUTE OF MACHINERY & MATERIALS;PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
发明人
CHOI, JI YEON;KIM, HYO JUNG;CHAE, SANG MIN;CHO, KOOK HYUN;LEE, SI WOO;LIM, MI RAE;KIM, YOUNG HYEON