| 摘要 |
PURPOSE: To provide a vapor growth device enhancing the productivity.CONSTITUTION: A vapor growth device includes n(n is an integer of 1 or more)reaction chambers for processing substrates, respectively, under a pressure less than atmospheric pressure, a cassette chamber having a cassette holding section where a cassette for holding a substrate can be installed, and the pressure of which can be reduced to a level less than atmospheric pressure, a transfer chamber provided between the reaction chamber and cassette chamber, and into which a substrate is conveyed under a pressure less than atmospheric pressure, and a substrate standby section capable of simultaneously holding n or more substrates processed in the reaction chamber, and provided in a region where the heatproof temperature is 500°C or more, and the pressure can be reduced less than atmospheric pressure.SELECTED DRAWING: Figure 1 |
