发明名称 RAW MATERIAL GAS SUPPLY APPARATUS, RAW MATERIAL GAS SUPPLY METHOD, AND FILM DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technology capable of suppressing operation rate degradation of an apparatus accompanying exchange of a raw material vessel 3, in supplying a raw material obtained by sublimation of WClto deposition process units 1A-1C.SOLUTION: A first raw material capture unit 41 and a second raw material capture unit 42 are installed in parallel in each of raw material supply systems 2A-2C arranged between a raw material vessel 3 and each of deposition units 1A-1C. A raw material gas is supplied to each of the first raw material capture unit 41 and the second raw material capture unit 42 and solidified again, and the solidified raw material is then sublimated by heating the first raw material capture unit 41 and the second raw material capture unit 42 and supplied to the deposition process unit 1A. The raw material is supplied from the first and second raw material capture units 41, 42 to the deposition process unit 1A (1B, 1C) in parallel with an exchange work of the raw material vessel 3, and therefore operation rate degradation of an apparatus accompanying the exchange of a raw material vessel 3 is suppressed.SELECTED DRAWING: Figure 2
申请公布号 JP2016084526(A) 申请公布日期 2016.05.19
申请号 JP20150045059 申请日期 2015.03.06
申请人 TOKYO ELECTRON LTD 发明人 MOROI MASAYUKI
分类号 C23C16/448;H01L21/285 主分类号 C23C16/448
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