| 发明名称 |
Mask Including Pellicle, Pellicle Repairing Apparatus, and Substrate Manufacturing Equipment |
| 摘要 |
Provided is a mask. The mask may include a mask substrate, mask patterns on the mask substrate, frames disposed on an edge of the mask substrate outside the mask patterns, and a pellicle spaced apart from the mask patterns, the pellicle being disposed on the frames, wherein the pellicle includes protection layers each of which has a nanometer thickness. |
| 申请公布号 |
US2016139501(A1) |
申请公布日期 |
2016.05.19 |
| 申请号 |
US201514755693 |
申请日期 |
2015.06.30 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Kim Mun Ja;KIM Byunggook;Park Jongju;Choi Jaehyuck |
| 分类号 |
G03F1/62 |
主分类号 |
G03F1/62 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A mask comprising:
a mask substrate; mask patterns on the mask substrate; frames disposed on an edge of the mask substrate outside the mask patterns; and a pellicle spaced apart from the mask patterns, the pellicle being disposed on the frames, wherein the pellicle comprises a plurality of protection layers, each of which has a nanometer thickness. |
| 地址 |
Suwon-si KR |
