HIGH PRECISION, HIGH RESOLUTION COLLIMATING SHADOW MASK AND METHOD FOR FABRICATING A MICRO-DISPLAY

摘要

The method for producing an OLED micro-display on a silicon wafer uses a collimating shadow mask formed on a silicon substrate. The mask is fabricated by depositing a material layer on the front side and on the back side of the substrate and etching a portion of the layer on the back side of the substrate to a reduced thickness of at least 20 microns. At least one opening is created in the etched portion of the substrate. The substrate beneath the opening is removed to create the mask. The mask is situated at a location spaced from the surface of the silicon wafer and exposed to a linear evaporation source. Organic layers are then deposited on the silicon wafer in a location aligned with the mask opening.

主权项

1. A method for fabricating a high precision, high resolution collimating shadow mask on a silicon substrate for use in producing an OLED micro-display including a sub-pixel on a silicon wafer, the method comprising the steps of:
reducing the thickness of the silicon substrate to form an area with a thickness of at least 20 microns; creating at least one opening at a predetermined location on the silicon substrate aligned with reduced thickness area; removing the substrate beneath the opening to create the mask; and situating the mask such that the opening in the silicon substrate is aligned with a portion of a silicon wafer where a sub-pixel will be formed.