| 发明名称 |
METHOD FOR OPERATING A POLISHING HEAD AND METHOD FOR POLISHING A SUBSTRATE |
| 摘要 |
A method for operating a polishing head is provided. The method includes keeping a stator of at least one electromagnetism actuated pressure sector stationary with respect to a carrier head, and electromagnetically and linearly moving an active cell of the electromagnetism actuated pressure sector with the stator to linearly move the active cell with respect to the carrier head. |
| 申请公布号 |
US2016136777(A1) |
申请公布日期 |
2016.05.19 |
| 申请号 |
US201615008707 |
申请日期 |
2016.01.28 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
SUEN Shich-Chang;CHAN Chin-Hsiang;CHEN Liang-Guang;LU Yung-Cheng |
| 分类号 |
B24B37/20 |
主分类号 |
B24B37/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for operating a polishing head, the method comprising:
keeping a stator of at least one electromagnetism actuated pressure sector stationary with respect to a carrier head; and electromagnetically cooperating an active cell of the electromagnetism actuated pressure sector with the stator to linearly move the active cell with respect to the carrier head. |
| 地址 |
Hsinchu TW |
