发明名称 SYSTEMS FOR PARSING MATERIAL PROPERTIES FROM WITHIN SHG SIGNALS
摘要 Semiconductor metrology systems based on directing radiation on a wafer, detecting second harmonic generated (SHG) radiation from the wafer and correlating the second harmonic generated (SHG) signal to one or more electrical properties of the wafer are disclosed. The disclosure also includes parsing the SHG signal to remove contribution to the SHG signal from one or more material properties of the sample such as thickness. Systems and methods described herein include machine learning methodologies to automatically classify obtained SHG signal data from the wafer based on an electrical property of the wafer.
申请公布号 WO2016077617(A1) 申请公布日期 2016.05.19
申请号 WO2015US60437 申请日期 2015.11.12
申请人 FEMTOMETRIX, INC. 发明人 KOLDIAEV, VIKTOR;KRYGER, MARC, CHRISTOPHER;CHANGALA, JOHN, PAUL;SHI, JIANING
分类号 H01L21/66 主分类号 H01L21/66
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