| 摘要 |
The present invention is to provide a resist composition capable of manufacturing a resist pattern with fewer defects and excellent line edge roughness. The resist composition comprises a resin having an acid-labile group (A1), a resin having a structural unit represented by formula (I) (A2), and an acid generator. In the formula: R^1 represents an alkyl group having 1-6 carbon atoms which may have a halogen atom, a hydrogen atom, or a halogen atom; R^2 represents a fluorinated saturated hydrocarbon group having 1-12 carbon atoms; A^1 represents an alkanediyl group having 2-6 carbon atoms or *-A^2-X^1-(A^3-X^2)_a-(A^4)-; * represents a binding site to an oxygen atom in -O-CO-; each of A^2, A^3, and A^4 independently represents an alkanediyl group having 1-6 carbon atoms; each of X^1 and X^2 independently represents -O-, -CO-O-, or -O-CO-; and a represents 0 or 1. |
