| 摘要 |
PROBLEM TO BE SOLVED: To provide an X-ray generation source that can suppress the positional deviation between an X-ray generation position and a mechanism for limiting an X-ray irradiation area with a relatively simple construction, and a fluorescent X-ray analysis device having the same.SOLUTION: An X-ray generation source has an X-ray tube 2 for irradiating a sample S with primary X-ray X1, a housing 3 in which the X-ray tube is mounted, an X-ray irradiation area limiting mechanism 4 for limiting an irradiation area of the primary X-ray to the sample, and a mechanism holder 5 for holding the X-ray irradiation area limiting mechanism in the housing. The X-ray tube has a housing 6, an electron beam source 7 for generating an electron beam and a target portion 8 which is fixed to the housing at the base end thereof and irradiated with the electron beam at the protruding tip portion thereof. The mechanism holder has a base end fixing portion 5a which is fixed to the housing just below the base end of the target portion, and an extending support portion 5b which extends from the base end fixing portion along the protrusion direction of the target portion and supports the X-ray irradiation area limiting mechanism.SELECTED DRAWING: Figure 1 |
