发明名称 |
INDUCTOR MANUFACTURING METHOD |
摘要 |
A method of manufacturing an inductor, includes: forming a coil pattern on a substrate by forming a conductive pattern on the substrate then growing the conductive pattern by plating; removing, if a plating residue is adhering to the coil pattern, the plating residue from the coil pattern; and outputting a cleaning request alarm that requests a plating bath to be cleaned if a number of times the plating residue has been removed or an amount of plating residue that has been removed exceeds a first threshold. |
申请公布号 |
US2016141101(A1) |
申请公布日期 |
2016.05.19 |
申请号 |
US201514834635 |
申请日期 |
2015.08.25 |
申请人 |
FUJITSU LIMITED |
发明人 |
ITOH Masayuki;KUROSAWA Hiroshi |
分类号 |
H01F41/04 |
主分类号 |
H01F41/04 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method of manufacturing an inductor, comprising:
forming a coil pattern on a substrate by forming a conductive pattern on the substrate then growing the conductive pattern by plating; removing, if a plating residue is adhering to the coil pattern, the plating residue from the coil pattern; and outputting a cleaning request alarm that requests a plating bath to be cleaned if a number of times the plating residue has been removed or an amount of plating residue that has been removed exceeds a first threshold. |
地址 |
Kawasaki-shi JP |