发明名称 |
HIGH RESOLUTION TRANSFER MASK AND METHOD FOR PRODUCING SAME |
摘要 |
The invention relates to a transfer mask with improved resolution for transfer lithography processes, and a method for the production thereof. Such a mask comprises a transparent carrier T and a functional layer FS arranged on top of it and having absorbing regions AB and reflecting regions RB, the absorbing regions AB and the reflecting regions RB lying in a common plane and being arranged without direct contact to each other, spaced apart by free spaces F. |
申请公布号 |
WO2016045667(A9) |
申请公布日期 |
2016.05.19 |
申请号 |
WO2015DE100406 |
申请日期 |
2015.09.28 |
申请人 |
VON ARDENNE GMBH |
发明人 |
BURGHART, MARKUS;HAASEMANN, GOERG |
分类号 |
C23C14/04;C23C14/28;H01L51/00 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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