发明名称 ILLUMINATION SUBSYSTEM
摘要 PROBLEM TO BE SOLVED: To provide illumination subsystems for multi-spot wafer inspection.SOLUTION: One illumination subsystem includes a diffractive optical element 22 configured to separate an illumination light beam into multiple light beams, and a refractive lens array 28 positioned in a path of the multiple light beams. The refractive lens array 28 is configured to relay the laser beam waist at the diffractive optical element onto a wafer surface and to separately and simultaneously focus each of the multiple light beams to a wafer under inspection.SELECTED DRAWING: Figure 2
申请公布号 JP2016085228(A) 申请公布日期 2016.05.19
申请号 JP20160008429 申请日期 2016.01.20
申请人 KLA-ENCOR CORP 发明人 NGUYEN THAO;AZMI KADKLY
分类号 G01N21/84;G01N21/956;G02B5/18;H01L21/66 主分类号 G01N21/84
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