| 发明名称 |
SELECTIVE VACUUM PRINTING MACHINE |
| 摘要 |
A system that may include a apertured structure that is configured to support a substrate and a vacuum supply unit that is configured to (i) prevent a supply of vacuum to a first area of the substrate during a first processing period during which the first area is processed and a second area of the substrate is not processed; (ii) provide vacuum to the second area during the first processing period; (iii) prevent the supply of vacuum to the second area during a second processing period during which the second area is processed and the first area is not processed; and (iv) provide vacuum to the first area during the second processing period. |
| 申请公布号 |
US2016143151(A1) |
申请公布日期 |
2016.05.19 |
| 申请号 |
US201514943123 |
申请日期 |
2015.11.17 |
| 申请人 |
CAMTEK LTD. |
发明人 |
Ben-Abu Yehuda |
| 分类号 |
H05K3/00;H05K3/12;B25B11/00 |
主分类号 |
H05K3/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A system, comprising:
a apertured structure that is configured to support a substrate; a vacuum supply unit that is configured to: prevent a supply of vacuum to a first area of the substrate during a first processing period during which the first area is processed and a second area of the substrate is not processed; provide vacuum to the second area during the first processing period; prevent the supply of vacuum to the second area during a second processing period during which the second area is processed and the first area is not processed; and provide vacuum to the first area during the second processing period. |
| 地址 |
Migdal Haemek IL |
