发明名称 |
MEASUREMENT SYSTEM AND MEASUREMENT METHOD |
摘要 |
A measurement system for measuring a consumption amount of a focus ring in a plasma etching apparatus including a processing chamber, a lower electrode and the focus ring surrounding a periphery of the lower electrode, comprises a sensor substrate having a distance sensor and a measurement unit configured to measure a consumption amount of the focus ring. The measurement unit includes a transfer instruction unit, an acquisition unit and a measurement unit. The transfer instruction unit is configured to instruct a transfer unit to transfer the sensor substrate into the processing chamber. The acquisition unit is configured to acquire information on a physical amount corresponding to a distance from the distance sensor to the focus ring, which is measured by the distance sensor. The measurement unit is configured to measure a consumption amount of the focus ring based on the acquired information on the physical amount. |
申请公布号 |
US2016141154(A1) |
申请公布日期 |
2016.05.19 |
申请号 |
US201514941925 |
申请日期 |
2015.11.16 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KAMATA Koji;IKARI Hiroshi |
分类号 |
H01J37/32;G01B7/06 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A measurement system for measuring a consumption amount of a focus ring in a plasma etching apparatus including a processing chamber configured to accommodate a target substrate, a lower electrode provided in the processing chamber and configured to mount thereon the target substrate loaded into the processing chamber by a transfer unit, and the focus ring surrounding a periphery of the lower electrode, the measurement system comprising:
a sensor substrate having a distance sensor; and a measurement unit configured to measure a consumption amount of the focus ring, wherein the measurement unit includes: a transfer instruction unit configured to instruct the transfer unit to transfer the sensor substrate into the processing chamber; an acquisition unit configured to acquire information on a physical amount corresponding to a distance from the distance sensor to the focus ring, which is measured by the distance sensor; and a measurement unit configured to measure a consumption amount of the focus ring based on the acquired information on the physical amount. |
地址 |
Tokyo JP |