发明名称 MEASUREMENT SYSTEM AND MEASUREMENT METHOD
摘要 A measurement system for measuring a consumption amount of a focus ring in a plasma etching apparatus including a processing chamber, a lower electrode and the focus ring surrounding a periphery of the lower electrode, comprises a sensor substrate having a distance sensor and a measurement unit configured to measure a consumption amount of the focus ring. The measurement unit includes a transfer instruction unit, an acquisition unit and a measurement unit. The transfer instruction unit is configured to instruct a transfer unit to transfer the sensor substrate into the processing chamber. The acquisition unit is configured to acquire information on a physical amount corresponding to a distance from the distance sensor to the focus ring, which is measured by the distance sensor. The measurement unit is configured to measure a consumption amount of the focus ring based on the acquired information on the physical amount.
申请公布号 US2016141154(A1) 申请公布日期 2016.05.19
申请号 US201514941925 申请日期 2015.11.16
申请人 TOKYO ELECTRON LIMITED 发明人 KAMATA Koji;IKARI Hiroshi
分类号 H01J37/32;G01B7/06 主分类号 H01J37/32
代理机构 代理人
主权项 1. A measurement system for measuring a consumption amount of a focus ring in a plasma etching apparatus including a processing chamber configured to accommodate a target substrate, a lower electrode provided in the processing chamber and configured to mount thereon the target substrate loaded into the processing chamber by a transfer unit, and the focus ring surrounding a periphery of the lower electrode, the measurement system comprising: a sensor substrate having a distance sensor; and a measurement unit configured to measure a consumption amount of the focus ring, wherein the measurement unit includes: a transfer instruction unit configured to instruct the transfer unit to transfer the sensor substrate into the processing chamber; an acquisition unit configured to acquire information on a physical amount corresponding to a distance from the distance sensor to the focus ring, which is measured by the distance sensor; and a measurement unit configured to measure a consumption amount of the focus ring based on the acquired information on the physical amount.
地址 Tokyo JP