发明名称 METHOD AND APPARATUS FORMING COPPER (Cu) OR ANTIMONY (Sb) DOPED ZINC TELLURIDE AND CADMIUM ZINC TELLURIDE LAYERS IN A PHOTOVOLTAIC DEVICE
摘要 A method and apparatus for an amount of Cu or Sb dopant incorporated into a zinc-based layer as the layer is being formed. The layer is formed over a coated substrate using an electrochemical deposition (ECD) process. In the ECD process, the bias voltage and plating solution composition may be systematically changed during the electrochemical deposition process to change the amount of Cu or Sb dopant incorporated into the plated layer.
申请公布号 US2016141444(A1) 申请公布日期 2016.05.19
申请号 US201615001794 申请日期 2016.01.20
申请人 First Solar, Inc. 发明人 Chen Long;Mrozek Pawel
分类号 H01L31/18;C25D21/02;C25D21/12;C25D17/00 主分类号 H01L31/18
代理机构 代理人
主权项 1. An electrochemical deposition system comprising: a first plating solution comprising a dopant, a complexing agent and a zinc-based semiconductor solute; and a first electrochemical deposition unit for forming at least a first portion of a doped zinc-based semiconductor layer on a partially completed photovoltaic device placed in the first plating solution, wherein the first electrochemical deposition unit is configured to incorporate the dopant from the first plating solution into the doped zinc-based semiconductor layer during a deposition process.
地址 Perrysburg OH US