Fabrication of Nanoscale Vacuum Grid and Electrode Structure With High Aspect Ratio Dielectric Spacers Between the Grid and Electrode

摘要

Some embodiments of vacuum electronics call for a grid that is fabricated in close proximity to an electrode, where, for example, the grid and electrode are separated by nanometers or microns. Methods and apparatus for fabricating a nanoscale vacuum grid and electrode structure are described herein.

主权项

1. A method of fabricating a device having an electrode and a grid, the method comprising:
depositing a first material on a substrate to form the electrode, wherein the electrode forms an etch stop for an etchant; depositing a second material, different from the first material, on the electrode, wherein the second material includes a dielectric; depositing and patterning a third material on the second material, wherein the patterned third material forms the grid; and etching the second material with the etchant to pattern the second material such that a pattern of the second material is defined by a pattern of the grid.