发明名称 |
SOLID-STATE IMAGING APPARATUS |
摘要 |
A solid-state imaging apparatus having a sensitivity difference between microlens regions hardly be recognized comprises: a plurality of pixels each of which has a photoelectric conversion portion, an optical element arranged above the photoelectric conversion portion, and a microlens arranged above the optical element, wherein the microlenses of the plurality of pixels include a plurality of microlenses of a first microlens structure arranged in a first microlens region, and a plurality of microlenses of a second microlens structure arranged in a second microlens region, the optical elements of the plurality of pixels include a plurality of optical elements of a first optical element structure arranged in a first optical element region, and a plurality of optical elements of a second optical element structure arranged in a second optical element region, and the first microlens region is arranged above a boundary between the first and second optical element regions. |
申请公布号 |
US2016141323(A1) |
申请公布日期 |
2016.05.19 |
申请号 |
US201514919795 |
申请日期 |
2015.10.22 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Igarashi Kazuya;Wada Zempei |
分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
1. A solid-state imaging apparatus comprising:
a plurality of pixels arranged two-dimensionally, wherein each of the plurality of pixels has a photoelectric conversion portion, an optical element arranged above the photoelectric conversion portion, and a microlens arranged above the optical element, wherein the microlenses of the plurality of pixels include a plurality of microlenses of a first microlens structure arranged in a first microlens region, and a plurality of microlenses of a second microlens structure different from the first microlens structure arranged in a second microlens region, the optical elements of the plurality of pixels include a plurality of optical elements of a first optical element structure arranged in a first optical element region, and a plurality of microlenses of a second optical element structure arranged in a second optical element region, and the first microlens region is arranged above a boundary between the first and second optical element regions. |
地址 |
Tokyo JP |