发明名称 SOLID-STATE IMAGING APPARATUS
摘要 A solid-state imaging apparatus having a sensitivity difference between microlens regions hardly be recognized comprises: a plurality of pixels each of which has a photoelectric conversion portion, an optical element arranged above the photoelectric conversion portion, and a microlens arranged above the optical element, wherein the microlenses of the plurality of pixels include a plurality of microlenses of a first microlens structure arranged in a first microlens region, and a plurality of microlenses of a second microlens structure arranged in a second microlens region, the optical elements of the plurality of pixels include a plurality of optical elements of a first optical element structure arranged in a first optical element region, and a plurality of optical elements of a second optical element structure arranged in a second optical element region, and the first microlens region is arranged above a boundary between the first and second optical element regions.
申请公布号 US2016141323(A1) 申请公布日期 2016.05.19
申请号 US201514919795 申请日期 2015.10.22
申请人 CANON KABUSHIKI KAISHA 发明人 Igarashi Kazuya;Wada Zempei
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项 1. A solid-state imaging apparatus comprising: a plurality of pixels arranged two-dimensionally, wherein each of the plurality of pixels has a photoelectric conversion portion, an optical element arranged above the photoelectric conversion portion, and a microlens arranged above the optical element, wherein the microlenses of the plurality of pixels include a plurality of microlenses of a first microlens structure arranged in a first microlens region, and a plurality of microlenses of a second microlens structure different from the first microlens structure arranged in a second microlens region, the optical elements of the plurality of pixels include a plurality of optical elements of a first optical element structure arranged in a first optical element region, and a plurality of microlenses of a second optical element structure arranged in a second optical element region, and the first microlens region is arranged above a boundary between the first and second optical element regions.
地址 Tokyo JP