| 发明名称 |
CLEANING COMPOSITION AFTER CHEMICAL MECHANICAL POLISHING OF ORGANIC FILM AND CLEANING METHOD USING THE SAME |
| 摘要 |
A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12. |
| 申请公布号 |
US2016137953(A1) |
申请公布日期 |
2016.05.19 |
| 申请号 |
US201514942206 |
申请日期 |
2015.11.16 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
LEE Ahn-Ho;JUNG Chung-Kyung;KANG Dong-Min;KANG Dong-Hun;KIM Go-Un;KIM Dong-Jin;YOO Yong-Sik;JUNG Young-Chul;JUNG Yu-Ri;CHOI Jung-Min;KIM Sang-Kyun |
| 分类号 |
C11D1/00;C11D3/30;C11D11/00;C11D3/20 |
主分类号 |
C11D1/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition for cleaning an organic film, the composition comprising:
an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the composition is equal to or higher than 12. |
| 地址 |
Suwon-si KR |
