IMPROVED METHOD FOR PATTERNING A THIN FILM

摘要

The invention relates to a method for producing at least one pattern in a film resting on a substrate, including the steps of a) making amorphous at least one first block (131) of an upper film of crystalline material resting on a first amorphous supporting film, while the crystalline structure of a second block (132) of the upper film that adjoins and juxtaposes said first block (131) is preserved, b) partially recrystallising the first block (131) by using at least one side surface of the second block (132) that is in contact with the first block as an area for the start of a recrystallisation front, the partial recrystallisation being carried out so as to preserve a region (1311) of amorphous material in the first block, c) selectively etching the amorphous material of the upper film with respect to the crystalline material of the upper film so as to form at least one first pattern in the upper film.