| 摘要 |
The present invention is to provide a resist composition capable of manufacturing a resist pattern with excellent line edge roughness. The resist composition comprises a resin having an acid-labile group (A1), a resin having a structural unit represented by formula (I) (A2), and an acid generator. In the formula: R^1 represents a hydrogen atom or a hydrocarbon group having 1-18 carbon atoms; A^1 represents a single bond, an alkanediyl group having 1-6 carbon atoms, or *-A^2-X^1-(A^3-X^2)_a-(A^4)_b-; * represents a binding site to an oxygen atom; each of A^2, A^3, and A^4 independently represents the alkanediyl group having 1-6 carbon atoms; each of X^1 and X^2 independently represents -O-, -CO-O-, or -O-CO-; a represents 0 or 1; b represents 0 or 1; and R^2 represents a fluorinated saturated hydrocarbon group having 1-13 carbon atoms. |
