发明名称 VACUUM TREATMENT METHOD, AND VACUUM TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment method capable of vacuuming a vacuum chamber in a short time using small energy with noise of a vacuum pump suppressed.SOLUTION: A first and second vacuum chambers 4a, 4b having film deposition means 7a, 8a, 6a in the inside are connected by a communication pipe 12 having on-off valves 13a, 13b. In the first and second vacuum chambers 4a, 4b, a vacuum treatment cycle is composed of a loading step of opening the vacuum chambers 4a, 4b and loading a work-piece 15 in the chambers, a closing step of closing the vacuum chambers 4a, 4b, a vacuuming step, a vacuum treating step of spattering, an opening step of opening the vacuum chambers 4a, 4b, and a work-piece discharging step. The vacuum treatment cycle is carried out in parallel and so that each step deviates from each other. When the closing step is finished for a vacuum chamber 4a and the vacuum treating step is finished for the other vacuum chamber 4b, the on-off valves 13a, 13b are temporarily opened to make the first and second vacuum chambers 4a, 4b communicate.SELECTED DRAWING: Figure 2
申请公布号 JP2016084497(A) 申请公布日期 2016.05.19
申请号 JP20140216934 申请日期 2014.10.24
申请人 JAPAN STEEL WORKS LTD:THE 发明人 NAKATA YUICHI;MAEDA TOSHIKI
分类号 C23C14/56;B01J3/00;B01J3/02;C23C16/54 主分类号 C23C14/56
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